Sputtering deposition is a PVD method in which a thin film is formed by sputtering a material from a target and then depositing it on a substrate.
The structure of the multilayer films are widely used in various field, and the precision systems require more stringent specifications, including light, sounds, and electricity components. The high-quality multilayer films are becoming increasingly important in precision systems that single material thin film cannot practice the required specifications. Therefore, the development of new materials and the processes of accurately control of thin films have become an important direction of multilayer thin films research.
For SYSKEY's multilayer sputter system has a substrate the planetary rotation mechanism, which can achieve accurate multilayer films structure and can be mass-produced.
Substrate revolution mechanism can realize precise multilayer film structure.
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