Sputtering deposition is a PVD method in which a thin film is formed by sputtering a material from a target and then depositing it on a substrate.
In-Line sputtering deposition system is that substrates passed linearly beneath one or more sputter cathodes to acquire their thin film coating. And it can just be chains running along rails through the vacuum chamber.
For the power can be any of the various types available, such as RF, DC, or pulsed DC asdesired for the application. Optional stages such as sputter etch, heat, or ion sources can also be accommodated, and the full array of instrumentations and controls are available formetallic/conductive coatings, dielectrics, optical coatings or other sputter applications.
For SYSKEY's in-line sputter deposition system, it provides precise control of in-line sputtering process conditions to provide customers with the best quality thin film.
|Configurations and benefits