Electron Beam Evaporation
E-beam is generated from a tungsten filament and driven by electric and magnetic fields toward source material and transforms it into the gaseous phase to be deposited on the substrate surface.
E-Beam Evaporation System
SYSKEY's electron beam deposition is a practical and highly reliable system. Our system can use a single large crucible for mass production, or multiple crucibles to achieve a multilayer film structure. We support semiconductor research and large equipment design. Planetary rotation design for single and multi-substrate can control the evaporation rate, the film thickness and uniformity is less than +/- 3%.
For the greatest process flexibility, an ion source can be integrated for Ion assisted deposition or pre-clean.
|Configurations and benefits