Products

Thermal Evaporate System

Description
  • Substrate Size: up to 12”( wafer) or 470 x 370 mm2 (glass)
  • Thickness uniformity:< 3%
  • <10-10 Torr Ultimate vacuum
  • Substrate heating up to 1300˚C
  • HV and UHV available
  • Custom Design available
  • Fully Safety Interlocked
  • Full automatic control system with touch screen display
  • Real time record system data (pressure, substrate temperature, deposition rate)
  • Real time process control to provide precise film quality and film reliability
  • Full auto control with touch screen display
  • Multiple levels of access with password protection
  • Co-deposition
  • Multiple sources with sequential operation
  • Quartz crystal monitor for closed loop thickness control
  • DC power supply with digital ammeter for sequential thin film deposition
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Options

  • Load-Lock
  • Choice of Turbo/Cryo/Diffusion Pump available
  • Combined with glove-box
  • Substrate heating
  • Substrate cooling
  • Ion-source
  • Residual Gas Analyzer
  • Connect with Glove box

Applications

  • Organic and metal materials research
  • Organic light emitting diode technology
  • Nano Film
  • CIGS solar-cell
  • Oxide and Metal materials research