UHV deposition system

  • Substrate Size: up to 8 inch
  • <10-10 Torr Ultimate vacuum
  • Substrate heating up to 1000˚C
  • Load-Lock System
  • Full auto control with touch screen display
  • Custom Design available
  • Fully Safety Interlocked
  • Full automatic control system with touch screen display
  • Real time record system data (pressure, substrate temperature, deposition rate)
  • Real time process control to provide precise film quality and film reliability
  • Multiple levels of access with password protection
  • Pumping system with TSP / Ion pump
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  • UHV Sputter/Thermal/E-Beam
  • Semiconductor films
  • Ultra-thin films
  • Nanostructured films