Oven Equipment         The vacuum oven system is designed to provide temperature control heating and drying applications requiring an airless environment.                 Physics Vapor Deposition Systems       The Syskey technology range of thin film deposition system is designed for production application and research development         Chemical Vapor Deposition Systems             We can fabricate from your drawings or use our in-house engineering to bring your ideas to fruition and solutions to your needs.                 Atomic Layer Deposition Systems     Basic ALD technology concept is to deposit one atomic layer per cycle during deposition. ALD is a surface controlled layer-by-layer process for the deposition of thin films with atomic layer accuracy which is basic fundamentals of nano-technology.         In-Line Products   The in-line system for thin film deposition in research and production for PVD (Physical Vapor Deposition) by RF and DC sputtering.               ETCH System                 FPD Equipment         The Syskey technology has been providing FPD system to many of the LCD manufacturers         Customer Designed         Our custom-made system offers a diverse configuration of products to meet the needs of process application