Products
Products 〉Thermal Evaporate System
Product ID：A100004
Thermal Evaporate System
- Substrate Size: up to 12”( wafer) or 470 x 370 mm2 (glass)
- Thickness uniformity:< 3%
- <10-10 Torr Ultimate vacuum
- Substrate heating up to 1300˚C
- HV and UHV available
- Custom Design available
- Fully Safety Interlocked
- Full automatic control system with touch screen display
- Real time record system data (pressure, substrate temperature, deposition rate)
- Real time process control to provide precise film quality and film reliabilit
- Full auto control with touch screen display
- Multiple levels of access with password protection
- Co-deposition
- Multiple sources with sequential operation
- Quartz crystal monitor for closed loop thickness control
- DC power supply with digital ammeter for sequential thin film deposition
Options
Load-Lock
Choice of Turbo/Cryo/Diffusion Pump available
Combined with glove-box
Substrate heating
Substrate cooling
Ion-source
Residual Gas Analyzerl
Connect with Glove box
Applications
Organic and metal materials research
Organic light emitting diode technology
Nano Film
CIGS solar-cell
Oxide and Metal materials research
