Products

Product ID:A100001

Sputtering System

  • 10-10 Torr Ultimate vacuum
  • Substrate heating up to 1000˚C
  • HV and UHV available
  • Custom Design available
  • Fully Safety Interlocked
  • Single, multi-layer or co-deposition
  • Full automatic control system with touch screen display
  • Real time record system data (pressure, substrate temperature, deposition rate)
  • Real time process control to provide precise film quality and film reliability
  • Multiple levels of access with password protection
  • Choice of Turbo/Cryo/Diffusion Pump available
  • Extra spare port for OES, RGA or extra process monitoring
  • Substrate Size: up to 12”
  • Thickness uniformity: <±3%
Options
Load-Lock and auto wafer load unload
RF or DC bias
Thickness Monitor
Substrate RF Plasma Cleaning
Ion-source
Residual Gas Analyzer
Connect with Glove box
 
Applications
Semiconductors
Nanotechnology
TCO (ITO, ZnO, AZO, GZO, IZO, IGZO etc)
Oxide, Nitride and Metal materials research
Solar-cell
Optical